Glass masks contribute to EUV mask blanks market expansion by offering exceptional surface smoothness, dimensional stability, ...

AUSTIN, Texas — Motorola researchers said they are on track to develop the masks needed for extreme ultraviolet (EUV) lithography, which is expected to enter manufacturing at the 50-nanometer ...

Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...

In a breakthrough set to revolutionize the semiconductor industry, the School of Engineering of the Hong Kong University of ...

(Nanowerk News) Recently, researchers from the Shanghai Institute of Optics and Fine Mechanics (SIOM) of the Chinese Academy of Sciences (CAS) have proposed a source mask optimization (SMO) technique ...

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...

Traditional lithography remains a standard in the industry, providing precision and a relatively cost-effective way to create patterns on the wafer when producing very high volumes of chips. However, ...

The eBeam initiative celebrated its 15 th anniversary at the recent SPIE Advanced Lithography + Patterning Conference. 130 members of the mask and lithography community attended the annual lunch to ...

2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...

In a breakthrough set to revolutionize the semiconductor industry, engineers have developed the world's first-of-its-kind deep-ultraviolet (UVC) microLED display array for lithography machines. This ...